High-Purity Sulphuric Acid (H₂SO₄)
- Applications: Wafer cleaning, photoresist stripping, and “piranha etch” solutions for removing organic contaminants.
- Saudi Advantage: Produced as a refinery by-product and refined for electronic grade.
- Format: Supplied in drums, IBC tanks, or bulk ISO tanks.
Isopropyl Alcohol (IPA)
- Applications: Solvent for wafer drying, photoresist stripping, and precision surface cleaning.
- Industry Role: Prevents contamination and ensures defect-free semiconductor wafers.
- Supply Advantage: Derived from Saudi petrochemical streams with reliable purity.
Hydrogen Peroxide (H₂O₂)
- Applications: Oxidizing and cleaning agent for wafers, often used with sulphuric acid in advanced cleaning processes.
- Use Case: Maintains ultra-clean wafer surfaces essential for chip fabrication.
- Format: Available in high-purity grades suitable for electronics.
High-Purity Hydrochloric Acid (HCl)
- Applications: Etching silicon wafers, chamber cleaning in semiconductor manufacturing.
- Advantage: Provides precise etching while maintaining surface integrity.
- Format: Available in bulk or specialty electronic packaging.
Nitric Acid (HNO₃)
- Applications: Oxidizing agent for wafer processing, surface preparation, and etching.
- Benefit: Enhances wafer surface cleanliness and process control.
Electronic Solvents
- Products: Acetone, Ethylene Glycol, Naphtha derivatives.
- Applications: Photoresist preparation, cleaning, coating, and processing.
- Supply Advantage: Consistent Saudi origin supply with export-ready packaging.
Specialty Gases (via partnerships)
- Products: Silane (SiH₄), Nitrogen Trifluoride (NF₃), Tungsten Hexafluoride (WF₆).
- Applications: Thin-film deposition, plasma cleaning, and semiconductor etching processes.
- Format: Supplied through specialized partnerships with gas handling expertise.